thickness1, n1,k1
thickness2, n2,k2
thickness3, n3,k3
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thickness1, {Material1}
thickness2, n2,k2
thickness3, {Material3}
Deposition materials currently available are: Ag,Al,Au,Cr,Cu,GaAs,ITO,Mo,Ni,Si,Si3N4,SiO2a,Ti. (SiO2a is amorphous SiO2) Contact Luxpop to get your favourite material added.
NOTE: if '{ }' characters do not work on your system, use '( )' characters.
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In lieu of one thickness, put semicolon-separated values in parentheses. Up to 3 sets are permitted.
thickness1, n1,k1
(thickness2a;thickness2b;thickness2c), n2,k2
(thickness3a;thickness3b;thickness3c), {Material3}
In this example, three sets of calculations are performed.
Set 1 has: layer 1 thickness1 layer 2 thickness2a layer3 thickness3a
Set 2 has: layer 1 thickness1 layer 2 thickness2b layer3 thickness3b
Set 3 has: layer 1 thickness1 layer 2 thickness2c layer3 thickness3c
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Calculate resistance of thin film stack. Either user-supplied resistivity values or default values can be used. Resistance determined by multiplying by thickness and dividing by area assumed to be 1 mm^2.
thickness1, n1,k1,Res1
thickness2, n2,k2,Res2
thickness3, {Material3},Res3
thickness4, {Material4}
In this example, the resistivity values Res1,Res2, and Res3 are used, along with the default resistivity value of Material4 (the value Res3 overrides the default value of Material3).
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